提出一种基于集成电路超微细加工技术制造电磁干扰滤波器的薄膜集成制造新技术。该技术主要是利用现有等平面超大规模集成电路工艺完成电磁线圈的制造，使之符合现有射频集成电路制造工艺。该技术将满足射频电子系统对轻型化、小型化、单片化的应用要求。

A new technique for fabricating EMIF in thin film IC based on superfine processing technique is proposed. It could be fully realized with equal plane IC fabrication processes, especially for inductance. With this method the EMIF might be so fabricated as to satisfy the requirements of miniaturization, light weight and monolithic integration.

TN4